Magnetic Polishing Pad Systems
The Kemet magnetic disc system is suitable for Kemet's range of magnetic polishing pads, diamond grinding and fine grinding discs, and any magnetic consumable from other suppliers. Available in 200mm, 250mm and 300mm diameter. Other sizes available upon request
- Greatly extended cloth life - up to 4 x longer compared to self adhesive pads
- Easier to change cloths
- No adhesive breakdown problems
- No more finger cutting - no risk to cut fingertips
- Adaptable to any process
- Fits to any magnetic plate
- Cleaner process
|10 Pack||Diameter (mm)|
Synthetic silk pad with durable woven structure for mirror finishing of most metals. Commonly used with 3 Micron Diamond compound or finer.
Extra hard synthetic silk pad on rigid backing. Used for increased cutting action and good general flatness control. Used with 14 Microndiamond compound and coarser.
For use with a chemical mechanical polishing process with Col-K colloidal silicoca suspension
Woven wool polishing cloth for polishing ferrous and non ferrous metals. Use with 3 Micron diamond compound.
Synthetic flock sprayed onto a flexible waterprooof carrier. Use with 6 micron diamond compound or finer.
Non woven chemo textile pad suitable for general polishing. Use with 3 Micron diamond compound.
A short nap with woven backing. Use with 3 Micron diamond compound or finer.
A soft short nap cloth suitable for mirror finishing. Use with 3 micron diamond compound.
A longer stiff nap cloth. Used with 6 Micron diamond compound or finer.